Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/7174
Title: Development of high-k dielectrics as an alternate gate oxide for logic and memory devices
Authors: Sharma, Urvashi
Thomas, Reji
Mishra, Sachin
Keywords: Electronics and electrical engineering
Issue Date: 2025
Publisher: Lovely Professional University, Phagwara
URI: http://localhost:8080/xmlui/handle/123456789/7174
Appears in Collections:Ph.D Thesis

Files in This Item:
File Description SizeFormat 
11814489.pdf4.31 MBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.