1. Lovely Professional University
  2. Ph.D Thesis
  3. Ph.D Thesis
Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/7174
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dc.contributor.authorSharma, Urvashi-
dc.contributor.authorThomas, Reji-
dc.contributor.authorMishra, Sachin-
dc.date.accessioned2025-07-07T05:49:36Z-
dc.date.available2025-07-07T05:49:36Z-
dc.date.issued2025-
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/7174-
dc.language.isoen_USen_US
dc.publisherLovely Professional University, Phagwaraen_US
dc.subjectElectronics and electrical engineeringen_US
dc.titleDevelopment of high-k dielectrics as an alternate gate oxide for logic and memory devicesen_US
dc.typeThesisen_US
Appears in Collections:Ph.D Thesis

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