Please use this identifier to cite or link to this item:
http://localhost:8080/xmlui/handle/123456789/7174| Title: | Development of high-k dielectrics as an alternate gate oxide for logic and memory devices |
| Authors: | Sharma, Urvashi Thomas, Reji Mishra, Sachin |
| Keywords: | Electronics and electrical engineering |
| Issue Date: | 2025 |
| Publisher: | Lovely Professional University, Phagwara |
| URI: | http://localhost:8080/xmlui/handle/123456789/7174 |
| Appears in Collections: | Ph.D Thesis |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 11814489.pdf | 4.31 MB | Adobe PDF | View/Open |
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